Macroporous silicon
Our macroporous silicon consists of n- or p-doped single-crystal silicon which is being etched using an photo-electrochemical process. The arrangement of the pores and the interpore distance are defined by a prestructured photo mask. The material can be used directly as a flow-through-membrane or as a one-side-closed template for the formation of macrostructures.
Our MakroPor membranes feature pores with an unique pore diameter (deviation lower 5%) which stays constant through the complete length of the pores. The pores are arranged evenly over the complete wafer size in an exact hexagonal or cubic regime due to the prestructuring step. By applying an additional anisotropic etching the round pores can be also widened to square-shaped pores.
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Material Properties
- Pore diameter adjustable from 1 µm up to 17 µm (or bigger)
- Interpore distance and arrangement of the pores adjustable by means of prestructurings through a photo mask
- Standard deviation < 5%
- Flow-through-membrane with symmetric pores
- Porous silicon with one-side-closed pores
- Pore depth from a few µm up to 500 µm
- Porosity adjustable starting from 20%
- Thermal stable up to 1200ºC (depending on the environment)
- Functionalization of the surface possible
Standard Products
| Interpore distance | Pore diameter | Pore length | Pore arrangement |
|---|---|---|---|
| 1.5 µm | 1 µm | 50, 200 µm | Trigonal |
| 4.2 µm | 2.5 µm | 50, 200 µm | Trigonal |
| 12 µm | 5 µm | 350, 500 µm | Square |
| 20 µm | 8 µm | 500 µm | Square |
Download MakroPor
The FactSheet PDF can be downloaded here.
The Safety Data Sheet (SDS) can be downloaded here.
